[TechView: EDA]
Software Confronts New Yield-Management Paradigm
David Maliniak
ED Online ID #21218
June 11, 2009
Copyright © 2006 Penton Media, Inc., All rights reserved. Printing of this document is for personal use only.
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Yield analysis, a science formerly
left to process engineers
in foundries, is not a luxury any
longer. According to Collett
International’s research, at least
40% of designs face at least one
respin with an associated delay
of from four to six weeks. At
least 22% of designs will see
two respins, so make that delay
12 to 16 weeks. Some 60% of
the issues causing these respins
are silicon related. Let’s not
forget that the new mask sets
for each respin cost at least $1
million.
The 90-nm node represented
a turning point in how fabless
semiconductor houses and
even integrated device manufacturers
(IDMs) approached
yield management. Before 90
nm, yield management was
addressed in a “classic” fashion,
with yield data analyzed for
trends and statistical controls
applied to the process. At 90 nm
and below, the game changed,
with many chip vendors adopting
design-for-manufacturing
(DFM) methodologies.
Now, at nodes of 90 nm and
smaller, a new paradigm has
emerged in the yield-management
realm. It’s no longer only
the process engineer looking
for feedback from the yieldmanagement
system. Faultanalysis
engineers, test engineers,
and layout engineers are
all looking for more data with
which to localize faults more
accurately.
To address the needs of this
newly broadened audience
for yield-management data,
Synopsys has launched Yield
Explorer, which is billed as a
“design-centric” yield-management
suite. Yield Explorer
aggregates data from lithography
and Spice simulations,
wafer-level and final-device
test, manufacturing test, and
any other form of custom data
into one database.
It applies advanced statistical
analyses and data mining techniques
to enable distillation of
everything from daily production
trends to complex interactions
between design, process,
and test.
Yield Explorer also fits into
existing design flows, taking
in data from all steps (see the
figure). That encompasses all
design signoff steps as well as
manufacturing-related phases
such as mask data prep, test
data, and diagnostics.
Yield-management data is
not traditionally known to be
design-friendly, so the challenge
on Synopsys’ plate was
how to lend a design-centric
flavor to this kind of information.
This was accomplished
by making a layout viewer the
core of the GUI, which takes
users directly to failing cells in
the design.
The GUI is augmented by a
dynamically extendable database
that doesn’t have to be
set up for fabs. Users at fabless
houses can organize data to see
parameters of interest to them.
Further, industry-standard
automation is built in through
tool command language (TCL)
scripting. Standard scripts
can be customized and passed
on to less experienced users,
relieving them from having to
consult with a bevy of “experts”
to get the job done.
A single Yield Explorer screen
might display everything, such
as wafer-level visualization of
all failing dies or a roster of
wafer-level statistics. Users
can see spatial distributions
across the wafer for the sorts
of parameters found in scribe
testing as well as in automated
test equipment (ATE) tests.
Another window might display
corner-lot comparison analysis
from Spice simulations.
Yet another can show correlations
between yield and design
attributes. For example, users
can look at the overlap of a transistor
on top of the oxide so
leakage is controlled. Users can
then plot the yield of that call
as a function of the geometry
by retrieving the geometry data
from the design database.
Synopsys asserts that Yield
Explorer will produce higher
confidence in analysis results.
Rather than just spitting out a
list of failing cells, leaving the
user to distinguish between
random and systematic failures,
Yield Explorer superimposes
a wafer map of failing
cells onto the results of criticalarea
analysis and assigns them
a physical defect-related failure
score. Once random and systematic
failure cells have been
categorized, the low-yield
wafers are further analyzed for
cross-domain correlations that
enable problems to be isolated
to particular nets.
The bottom line is that yield
management that traditionally
has taken two to three weeks
in a flow involving multiple
manually driven tools (with
multiple experts driving them)
now can take as little as two to
three days in a single-tool setting.
The resulting physical
failure analysis is also considerably
more accurate, according
to Synopsys.
For further information, including pricing
and availability, contact Synopsys
directly.
Synopsys
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