By acquiring Invarium Inc., Cadence Design Systems has added advanced lithography-modeling and pattern-synthesis technology to its lineup. Invarium’s pattern-synthesis capabilities enable high-quality pattern resolution and faster yield ramp for designs targeted to 45-nm-and-below process technologies.
This acquisition strengthens Cadence’s technology for functional and parametric yield improvement, enabling the prevention, detection, correction, and optimization of manufacturing effects on advanced geometry designs.
Invarium’s specific area of expertise is the development of pattern-synthesis technologies, which enable photomask design and process optimization encompassing the entire manufacturing-process flow from mask making to lithography and etch.
The acquisition was completed on July 10. Terms of the agreement were not disclosed.
Cadence Design Systems
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