Models for Transport and Chemistry in CVD Reactors
Join us for an insightful webinar exploring the multiphysics modeling of CVD reactors, where we’ll unveil how a 2D axisymmetric model can be simplified to a one-dimensional finite gap stagnation flow, optimizing thin film growth for electronics using COMSOL® software.
This webinar was originally held on December 5, 2024.
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Summary
Chemical vapor deposition (CVD) reactors are used in the growth of thin films for electronics. Uniformity in the thickness and composition of the film are important requirements of such reactors, alongside optimum usage of reactants. A 2D axisymmetric model of the reactor that can determine a reasonable operating range needs to include fluid flow, heat transfer, and transport of chemical species.
In this webinar, we will describe the multiphysics modeling of CVD reactors and the special conditions under which the model can be reduced to a one-dimensional finite gap stagnation flow, set up using the Coefficient Form PDE feature in the COMSOL® software.
Speakers
Meenakshi Mamunuru Lam Research Corporation
Meenakshi Mamunuru works as a modeling engineer at Lam Research Corporation, where she has more than ten years of experience in reactor scale modeling of semiconductor tools with a focus on low temperature plasmas, RF, and heat & mass transfer.
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