Modeling ECD with machine learning for CMP simulation
Aug. 2, 2021
Accurate post-ECD models are essential to successful CMP simulation. Adding machine learning can improve your results, but which approach should you use?
Accurate modeling of post-ECD surface topography variation is crucial for correct CMP simulation. Siemens and the American University of Armenia collaborated to investigate and evaluate the use of machine learning (ML) modeling techniques to predict these complicated topography variations. Using various ML methods to model post-ECD surface profiles and comparing the results enabled them to determine which architectures and models provided the best combination of running time and accuracy.
The competitive manufacturing environment and ongoing labor shortages have increased the demand for immediate robotics solutions. However, traditional industrial robots have been...
