Digital measuring instrument serves production applications

Oct. 3, 2015

Marlborough, MA. HBM Inc. has introduced the DMP41 digital precision measuring instrument. With an accuracy class of 0.0005 (or 5 ppm), the company say, the DMP41 is the most precise amplifier for strain gauge-based sensor measurements, adding that several national metrology institutes use the DMP41 as a reliable reference instrument for high-precision comparative measurements.

Normally, high-precision instruments with this level of performance are limited for use only in controlled laboratory conditions, HBM says. Now, however, the DMP41 is available in a 19″ rack-mount enclosure that is constructed to enable the instrument’s use in environments with demanding EMC conditions, such as the production floor. Manufacturers of strain gauge-based sensors, such as force, torque, and pressure transducers; load cells; and flow-rate sensors can now use the DMP41 to more precisely calibrate and adjust their sensors during production. Like its predecessor, the DMP41 can be ordered with either two or six measurement channels.

The DMP41 is the result of more than 30 years of innovation as part of the company’s DMP Series family of products.

In addition to the more rugged packaging, several other new features have been added to make it more useful in manufacturing. The patented background calibration feature, for example, allows the instrument to make measurements even while internal calibration of internal measurement channels is in progress. This increases test system throughput.

The user interface has also been improved. In addition to manual control via the integrated keyboard, users can now control the instrument via a touchscreen or PC. To connect the DMP41 to a PC, users can choose an Ethernet, USB or RS-232 interface.

www.hbm.com/en/menu/products/measurement-electronics-software/precision-measuring-instruments/dmp41/

About the Author

Rick Nelson | Contributing Editor

Rick is currently Contributing Technical Editor. He was Executive Editor for EE in 2011-2018. Previously he served on several publications, including EDN and Vision Systems Design, and has received awards for signed editorials from the American Society of Business Publication Editors. He began as a design engineer at General Electric and Litton Industries and earned a BSEE degree from Penn State.

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