Reno Precis Generator 7x5 300dpi

Reno Sub-Systems extends solid-state RF lineup at SEMICON West

July 10, 2017

San Francisco, CA. Reno Sub-Systems, a producer of high-performance RF matching networks, RF power generators, and gas-flow management systems for semiconductor manufacturing, today announced at SEMICON West the latest addition to its Precis Solid-State Generator portfolio. Capable of 1.6-kW microwave output at 2.45 GHz, the new Precis generator offers the highest-power solid-state microwave generator available for semiconductor plasma applications, the company said, adding that its approach to power generation fills a growing need for advanced subsystem technologies to keep the industry on pace with Moore’s law.

“For the first time in decades, subsystems are enabling new processes and future device generations,” said Bob MacKnight, CEO of Reno Sub-Systems. “The ultimate validation of our technology is that 80% of the top semiconductor device manufacturers and equipment makers have ordered Reno products.”

The Precis microwave generator delivers accurate, repeatable, and stable microsecond ramp times using a reliable solid-state architecture. The Precis’ microwave power control offers better frequency control than comparable magnetron-based microwave generators, the company said. Eliminating aging magnetron technology also reduces maintenance requirements, and thereby cost of ownership.

The Precis family of generators is the latest addition to Reno’s differentiated Velocity Series EVC matching networks portfolio. Delivering better performance and process capabilities, the Velocity EVC matching network achieves ranges from 500 W to 4.5 kW with frequencies of 500 kHz to 40 MHz.

Precis Microwave Generator specifications:

  • 6-kW microwave output at 2.45 GHz
  • Operates from 200/208, 3-phase, 50/60-Hz VAC
  • Coaxial and waveguide output options
  • Serial and analog communication
  • DeviceNet and EtherCAT communication options available
  • 19″ rack mount design for ease of integration

http://www.renosubsystems.com

About the Author

Rick Nelson | Contributing Editor

Rick is currently Contributing Technical Editor. He was Executive Editor for EE in 2011-2018. Previously he served on several publications, including EDN and Vision Systems Design, and has received awards for signed editorials from the American Society of Business Publication Editors. He began as a design engineer at General Electric and Litton Industries and earned a BSEE degree from Penn State.

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