Cadence Acquires Invarium To Beef Up DFM Technology

July 23, 2007

By acquiring Invarium Inc., Cadence Design Systems has added advanced lithography-modeling and pattern-synthesis technology to its lineup. Invarium’s pattern-synthesis capabilities enable high-quality pattern resolution and faster yield ramp for designs

David Maliniak

This acquisition strengthens Cadence’s technology for functional and parametric yield improvement, enabling the prevention, detection, correction, and optimization of manufacturing effects on advanced geometry designs.

Invarium’s specific area of expertise is the development of pattern-synthesis technologies, which enable photomask design and process optimization encompassing the entire manufacturing-process flow from mask making to lithography and etch.

The acquisition was completed on July 10. Terms of the agreement were not disclosed.

Cadence Design Systems
www.cadence.com

About the Author

David Maliniak | MWRF Executive Editor

In his long career in the B2B electronics-industry media, David Maliniak has held editorial roles as both generalist and specialist. As Components Editor and, later, as Editor in Chief of EE Product News, David gained breadth of experience in covering the industry at large. In serving as EDA/Test and Measurement Technology Editor at Electronic Design, he developed deep insight into those complex areas of technology. Most recently, David worked in technical marketing communications at Teledyne LeCroy. David earned a B.A. in journalism at New York University.